The atomic rearrangement technology realizes the long-range orderly arrangement of different coating materials to achieve a perfect match between hardness and toughness, effectively solving the problem of high temperature instability at the interface of multiple coatings and improving the high temperature performance of the coating.
High-toughness substrate and TiAlN-based nano multilayer coating, unique ion etching technology, strengthen the cutting edge, and improve the bonding strength between the coating and the substrate.